Analyzing Surface Microstructure of 7050A1 Alloy Modified by <TEX>$N^+ion$</TEX> Implantation

Lee, Chang Woo; 이창우; Kwun, S.I.; 권숙인; Han, Jeon Geon; 한전건

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P-ISSN1225-0163
E-ISSN2288-8985
SCOPUS, ESCI, KCI

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P-ISSN 1225-0163
E-ISSN 2288-8985

e-Submission

Vol.7, No.4

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Analyzing Surface Microstructure of 7050A1 Alloy Modified by $N^+ion$ Implantation

Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985

1994, v.7 no.4, pp.527-540

Lee, Chang Woo
Kwun, S.I.
Han, Jeon Geon

Lee, C. W., Kwun, S., & Han, J. G. (1994). Analyzing Surface Microstructure of 7050A1 Alloy Modified by <TEX>$N^+ion$</TEX> Implantation. , 7(4), 527-540.

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Abstract

The surface microstructure modification by $N^+ion$ implantation into 7050A1 alloy was investigated. Ion implantation method is to implant physically accelerated ions to the surface of a substrate. High doses of nitrogen($5{\times}10^{15}ions/cm^2$, $5{\times}10^{17}ions/cm^2$, $8{\times}10^{17}ions/cm^2$) were implanted into 7050A1 alloy using accelerating voltage of 100KeV and current density of $23.1{\mu}A/cm^2$. The implanted layers were characterized by EPMA, AES, XRD, and TEM. The experimental results were compared with computer simulation data. The results showed that AlN was formed from the surface to $4000{\AA}$ depth with Gaussian distribution and the damage region was also observed. This surface modification by $N^+ion$ implantation increased the microhardness of 7050A1 alloy surface.