Trace impurities analysis of the electronic polymer resins by neutron activation analysis

윤윤열; 조수영; 이길용; 양명권; 심상권; 정용삼

오늘 하루 그만보기

P-ISSN1225-0163
E-ISSN2288-8985
SCOPUS, ESCI, KCI

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P-ISSN 1225-0163
E-ISSN 2288-8985

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Vol.17, No.4

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Trace impurities analysis of the electronic polymer resins by neutron activation analysis

Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985

2004, v.17 no.4, pp.308-314

& (2004). Trace impurities analysis of the electronic polymer resins by neutron activation analysis. , 17(4), 308-314.

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Abstract

When the polymer was used for the guard raw materials of electronic device, the content of U, Th and their daughter nuclides were known as a factor of soft error. Because emitted alpha ray could be caused of mis-operation. And ionic impurities such as Cl, Fe, Na could shorten the device life-time. For the analysis of trace impurities in the polymer, neutron activation analysis(NAA) and ICP/AES have been studied. To improve the accuracy and sensitivity of the trace and ultratrace metallic impurities in the epoxy and phenol polymer, sample pretreatment method and optimum analytical condition of NAA were developed. Using the above method, U, Th and other 23 trace impurity elements were analyzed.